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Spiral-scan atomic force microscopy: a constant linear velocity approach

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conference contribution
posted on 2025-05-10, 23:40 authored by Iskandar A. Mahmood, S. O. Reza Moheimani
This paper describes an alternative method to the widely-used raster-scan technique for Atomic Force Microscopy (AFM). In this method, the sample is scanned in a spiral pattern instead of the well established raster trajectory. A spiral pattern is produced by applying cosine and sine signals with slowly varying amplitudes to the x-axis and y-axis of an AFM scanner respectively. In order to ensure that the spiral trajectory travels at a constant linear velocity (CLV), frequency and amplitude of the input signals are varied simultaneously in a way that the linear velocity of the scanner is kept constant. Experimental results obtained by implementing the CLV spiral scan on a commercial AFM indicate that, compared with the raster-scan method, high-quality AFM images of equal area and pitch can be generated two times faster and using half of the total traveled distance.

History

Source title

Proceedings of the 10th IEEE International Conference on Nanotechnology, Joint Symposium with Nano Korea

Name of conference

10th IEEE International Conference on Nanotechnology, Joint Symposium with Nano Korea 2010 (IEEE-NANO)

Location

Seoul, Korea

Start date

2010-08-17

End date

2010-08-20

Pagination

115-120

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Place published

Piscataway, NJ

Language

  • en, English

College/Research Centre

Faculty of Engineering and Built Environment

School

School of Electrical Engineering and Computer Science

Rights statement

Copyright © 2010 IEEE. Reprinted from the Proceedings of the 10th IEEE International Conference on Nanotechnology, Joint Symposium with Nano Korea. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of the University of Newcastle's products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.

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